Research
About
Equipment
About
Users Committee
Equipment
Raman Spectroscopy
Terahertz Imaging
Atomic Force Microscopy
Synthesis Area
Magneto Transport Spectroscopy
Femto-laser
Fees and Chemical Information
User Access
Reservation/Booking
Semi-Conductors Physics
Terahertz Photonics
Nuclear, Particle Physics, and Cosmology
Space Science and Technology
OCP Track
Publications
Synthesis Area
Guarantor
Vivek Chaudhary, Scientist
Instrument status:
Operational 27/03/2024
Equipment placement:
Research Center UM6P
1. Chemical Vapor Deposition Furnace (Code Booking: “CVD”)
The synthesis research area has a three-zone chemical vapor deposition furnace. This furnace provides the controlled synthesis of novel two-dimensional semiconductors, such as Graphene and 2D chalcogenides (MoS2, WS2, MoSe2, WSe2, etc.).
Specification:
| Heating zone | 03 |
| Maximum temperature | 1100 °C in each zone |
| Maximum heating rate | 10 °C |
| Maximum vacuum level | 6.67 × 10-4 Pa |
| Available gases | Ar, N2, CH4 |
| Mass flow meter | Separate mass flow meter for each gas |
2. Single Zone Tube Furnace (Chemical Vapor Transport) – Code Booking: CVT
The synthesis research area is also equipped with a single-zone tube furnace for a wide range of thermal processes, including inorganic and organic purification, accelerated aging, annealing, coating, drying, and much more. In our laboratory, the furnace is mostly used for the crystallization of bulk 2D materials, especially black phosphorous.
Specification:
| Heating zone | 01 |
| Maximum temperature | 1250 °C |
| Maximum heating rate | 25 °C |
| Operational conditions | Only atmospheric conditions |
3. Other Essential equipment
The synthesis research area also has a Glovebox, Ultrasonic Cleaner, Hot Plate and Magnetic Steering, Spin Coating Unit, and Optical Microscope.