Synthesis Area

Guarantor

Vivek Chaudhary, Scientist

Instrument status:
Operational 27/03/2024

Equipment placement:
Research Center UM6P

1. Chemical Vapor Deposition Furnace (Code Booking: “CVD”)

The synthesis research area has a three-zone chemical vapor deposition furnace. This furnace provides the controlled synthesis of novel two-dimensional semiconductors, such as Graphene and 2D chalcogenides (MoS2, WS2, MoSe2, WSe2, etc.).

Specification:

Heating zone 03
Maximum temperature 1100 °C in each zone
Maximum heating rate 10 °C
Maximum vacuum level 6.67 × 10-4 Pa
Available gases Ar, N2, CH4
Mass flow meter Separate mass flow meter for each gas

2. Single Zone Tube Furnace (Chemical Vapor Transport) – Code Booking: CVT

The synthesis research area is also equipped with a single-zone tube furnace for a wide range of thermal processes, including inorganic and organic purification, accelerated aging, annealing, coating, drying, and much more. In our laboratory, the furnace is mostly used for the crystallization of bulk 2D materials, especially black phosphorous.

Specification:

Heating zone 01
Maximum temperature 1250 °C
Maximum heating rate 25 °C
Operational conditions Only atmospheric conditions

3. Other Essential equipment

The synthesis research area also has a Glovebox, Ultrasonic Cleaner, Hot Plate and Magnetic Steering, Spin Coating Unit, and Optical Microscope.